Why is there great difference in the alpha and beta position in eletrophilic reaction of furan

Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

Acontainer holds 35.8 moles of gas under 10.0 atm of pressure at 70.0 c. what is the volume of the container?

The atomic number, or number, is the described as the number of in the nucleus of an chemical element.