Answers: 1
Chemistry, 21.06.2019 16:00
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900Ëšc, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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Chemistry, 22.06.2019 10:00
How many mmols of tris-hcl are there in 100 ml of a 100 mm tris-hcl buffer solution at ph 8.1? note that the 100 mm refers to the sum of tris and tris-hcl concentrations?
Answers: 3
Chemistry, 22.06.2019 19:30
Estimate the molar mass of the gas that effuses at 1.6 times the effusion rate of carbon dioxide.
Answers: 1
How many reactants are there?...
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