3.36 An article in the Journal of the Electrochemical Society (Vol. 139, No. 2, 1992, pp. 524–532) describes an experiment to investigate the low-pressure vapor deposition of polysilicon. The experiment was carried out in a large-capacity reactor at Sematech in Austin, Texas. The reactor has several wafer positions, and four of these positions are selected at random. The response variable is film thickness uniformity. Three replicates of the experiment were run, and the data are as follows: Wafer Position Uniformity 1 2.76 5.67 4.49 2 1.43 1.70 2.19 3 2.34 1.97 1.47 4 0.94 1.36 1.65 (a) Is there a difference in the wafer positions? Use = 0.05. (b) Estimate the variability due to wafer positions. (c) Estimate the random error component. (d) Analyze the residuals from this experiment and comment on model adequacy.

go and ask your mom to you

b

step-by-step explanation:

a difference is the result of subtraction. while each of these expressions has subtraction in it, a difference will be the result when subtraction is the last operation applied in the order of operations for the expression. this means subtraction must be outside of the parenthesis. only b has this.

false

step-by-step explanation:

rulers and compasses arent required in order to bisect an angle because when bisecting angles, you're making a "half circle" and considering in order to bisect an angle it wouldn't be straight, you wouldn't need either of the two

answer: 204

step-by-step explanation:

we are told that the revenue is

x⋅(4080−10x)=−10x^2+4080x

this is a quadratic function, so to maximize it we should find the x-value of its vertex. recall that the x-value of the vertex of the parabola ax^2+bx+c is given by the formula −b/2a.

so in this case, we have a=−10 and b=4080, so the x-value of the vertex is

−b/2a= −(4080)/2(−10)=204