Purity of copper films by evaporation and sputtering.

(a) Discuss three factors that affect the purity of copper films when deposited by evaporation from a tungsten filament.

(b) Discuss three factors that affect the purity of copper films when deposited by argon sputtering of a copper target.

If the thermal strain developed in polyimide film during deposition is given as 0.0044. assume room temperature is kept at 17.3 c, and thermal coefficient of expansion for the film and the substrate are 54 x 10^-6c^-1 and 3.3 x 10^-6c^-1respectively. calculate the deposition temperature.

Fluids at rest possess no flow energy. a)- true b)- false

Asingle-geared blanking press has a stroke of 200 mm and a rated capacity of 320 kn. a cam driven ram is assumed to be capable of delivering the full press load at constant force during the last 15 percent of a constant-velocity stroke. the camshaft has an average speed of 90 rev/min and is geared to the flywheel shaft at a 6: 1 ratio. the total work done is to include an allowance of 16 percent for friction a) estimate the maximum energy fluctuation b) find the rim weight for an effective diameter of 1.2 m and a coefficient of speed fluctuation of 0.10