Value 1: 45.58g Value 2: 45.08g
Value 3: 54.53g
Standard deviation:5.3175
What is the percent error?
Please hurry this is very important and I need to get it done fast

Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

Ahydrogen atom has 1 electron. how many bonds can hydrogen form? a) 1 b) 2 c) 3 d) 4 e) 5

Consider the reduction reactions and their equilibrium constants. cu+(aq)+e−↽−−⇀cu(s)pb2+(aq)+2e−↽−−⇀pb(s)fe3+(aq)+3e−↽−−⇀fe(=6.2×108=4.0×10−5=9.3×10−3 cu + ( aq ) + e − ↽ − − ⇀ cu ( s ) k =6.2× 10 8 pb 2 + ( aq ) +2 e − ↽ − − ⇀ pb ( s ) k =4.0× 10 − 5 fe 3 + ( aq ) +3 e − ↽ − − ⇀ fe ( s ) k =9.3× 10 − 3 arrange these ions from strongest to weakest oxidizing agent.