What is the noble gas configuration for silicon?

Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

For the reaction shown, find the limiting reactant for each of the following initial amounts of reactants. 4al(s)+3o2(g)→2al2o3(s) a) 1 molal, 1 mol o2 b) 4 molal, 2.6 mol o2 c) 16 molal, 13 mol o2 d) 7.4 molal, 6.5 mol o2

The characteristics of two different types of reactions are shown below: reaction a: electrons are gained by the atoms of an element. reaction b: protons are lost by the atom of an element. which statement is true about the atoms of the elements that participate in the two reactions? their identity changes in both reaction a and reaction b. their identity changes in reaction a but not in reaction b. their identity changes in reaction b but not in reaction a. their identity remains the same in both reaction a and reaction b.