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Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

Construct the hypothetical phase diagram for metals a and b between room temperature (20c) and 700c, given the following information: * the melting temperature of metal a is 480c. • the maximum solubility of b in a is 4 wt% b, which occurs at 420c. • the solubility of b in a at room temperature is 0 wt% b. • one eutectic occurs at 420c and 18 wt% b–82 wt% a. • a second eutectic occurs at 475c and 42 wt% b–58 wt% a. • the intermetallic compound ab exists at a composition of 30 wt% b–70 wt% a, and melts congruently at 525c.• the melting temperature of metal b is 600c. • the maximum solubility of a in b is 13 wt% a, which occurs at 475c. • the solubility of a in b at room temperature is 3 wt% a.

If a plot weight (in g) vs. volume (in ml) for a metal gave the equation y= 13.41x and r^2=0.9981 what is the density of the metal?